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Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes. (arXiv:2109.10904v1 [physics.optics]) http://arxiv.org/abs/2109.10904
Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes. (arXiv:2109.10904v1 [physics.optics]) http://arxiv.org/abs/2109.10904